Cambridge NanoTech Inc.

THESES

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1. Atomic Layer Deposition of Metal Oxide and Nitride Thin Films, Jill S. Becker, Harvard University, Cambridge MA, USA

2. Atomic Layer Deposition of Metal Oxide Thin Films, Dennis M. Hausmann, Harvard University, Cambridge MA, USA

3. Atomic Layer Deposition of TaN, NbN, and MoN Films for Cu Metallizations, Petra Alén, University of Helsinki, Finland

4. Atomic Layer Deposition of Noble Metal Thin Films, Titta Aaltonen, University of Helsinki, Finland

5. Atomic Layer Deposition of High-k Dielectrics from Novel Cyclopentadienyl-Type Precursors, Jaakko Niinist? Helsinki University of Technology, Finland

6. Atomic Layer Deposition of Lanthanide Oxide Thin Films, Jani Päiväsaari, Helsinki University of Technology, Finland

7. Preparation by Atomic Layer Deposition and Characterisation of Catalyst Supports Surfaced with Aluminium Nitride, Riikka Puurunen, Helsinki University of Technology, Finland

8. Atomic Layer Deposition of Copper, Copper(I) Oxide and Copper(I) Nitride on Oxide Substrates, Tobias Torndahl, Uppsala University, Sweden

9. ALD theses on Scirius.com