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NANOTUBES & NANOWIRES

A classical application for ALD is the deposition of gate dielectrics for devices that do not have native oxides. Carbon nanotubes are a typical example. The groundbreaking work in this field demonstrated complementary p- and n-type carbon nanotube transistors with ZrO2 gates. Complementary NOT gates were made with a voltage gain up to 60.

Coaxial coating of ZnO nanowires with ALD-Al2O3 coatings were transformed into spinel nanotubes using the Kirkendahl effect, by one of our customers.

Many more nanotube and nanowire ALD applications can be found on our search page

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.