Home

|

Atomic Layer Deposition

|

Products

|

Services

|

Science

|

Contact Us

|

Media

LASERS

In an example of a laser made by ALD, polystyrene opal templates are deposited by self-assembly onto glass substrates, infiltrated with ZnO by ALD, and removed by firing at elevated temperatures. The resulting photonic crystal structures are face-centered cubic arrays of air spheres surrounded by ALD-ZnO dielectric shells with a thickness of typically 50 layers. UV lasing is demonstrated at room temperature. The photonic crystals are inverse opals with high refractive index contrast that simultaneously confine light and provide optical gain. Highly directional lasing with tunable wavelength is obtained by optical pumping.

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.