Cambridge NanoTech manufactures Atomic Layer Deposition (ALD) systems for a variety of coating applications.
ALD is a self-limiting process used to deposit thin films one atomic layer at a time. This results in near perfect
films with digital control on the atomic level. A large number of standard materials are available for deposition.
The principle of ALD is based on sequential pulsing of special precursor vapors, each of which forms about one atomic layer each pulse. Cambridge NanoTech systems, such as the Savannah™, are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities. The ability to deposit such high quality films on substrates with ultra-high aspect ratios is a key feature of Cambridge NanoTech systems.
Cambridge NanoTech is the world leader in Atomic Layer Deposition systems for research and industry. Our dedicated team of ALD scientists is here to work with you to find solutions to your thin film challenges. So, come join the market leader with more than 100 systems sold worldwide.
The principle of ALD is based on sequential pulsing of special precursor vapors, each of which forms about one atomic layer each pulse. Cambridge NanoTech systems, such as the Savannah™, are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities. The ability to deposit such high quality films on substrates with ultra-high aspect ratios is a key feature of Cambridge NanoTech systems.
Cambridge NanoTech is the world leader in Atomic Layer Deposition systems for research and industry. Our dedicated team of ALD scientists is here to work with you to find solutions to your thin film challenges. So, come join the market leader with more than 100 systems sold worldwide.
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