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ELECTROLUMINESCENCE

Atomic Layer Deposition (ALD), originally called atomic layer epitaxy (ALE), was developed in the 1970s by Suntola and Antson to meet the needs of producing high-quality, large-area flat panel displays based on thin film electroluminescence (TFEL), as discussed in this review . The core of a TFEL device consists of a large band-gap, doped semiconducting layer (e.g. ZnS:Mn) surrounded from both sides by insulating oxide layers (aluminum titanium oxide, ATO) which all could be fabricated by ALD. More recently, Thin films of sphalerite-type ZnSe were grown by ALD from elemental Zn and Se precursors. These films, grown on various substrates, show bright blue edge emission accompanied by donor-acceptor pair emissions in the blue, green and red spectral regions. Red, green and blue emissions mixed together give a white color, with a color temperature between 2400 and 4500 K depending on a layer thickness and temperature. ZnSe grown by ALD is in consequence a promising material for the fabrication of semiconductor-based white light emitting thin film electroluminescence displays. In a separate publication , blue- and green-emitting SrS:Cu electroluminescent devices were successfully deposited using ALD.

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.