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SYNTHESIS OF NEW PRECURSORS

Cambridge NanoTech ALD systems are in use by many chemists to successfully develop and test new ALD precursors. Standard heating of precursors up to 300C, substrate temperatures up to 500C, nitrogen boost and complete heating of all valves and components give good results even for hard to vaporize precursors. In situ analysis such as X-ray, ellipsometry and many other techniques can be used in custom ALD configurations to study growth during deposition. ALD systems can be adapted to gloveboxes to study moisture sensitive coatings.

Inquire also about our new Vapix wide-temperature range precursor vapor pressure measurement tool. This tool has been developed for chemists who synthesize ALD precursors and allows automatic measurement of vapor pressure from 100K-300C.

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.