ANTIREFLECTION
Anti reflection (AR) coatings are essential in the optical and ophthalmic industries.
They usually consist of low-high refractive index multilayers, such as
SiO2
-ZrO2 or SiO2-TiO2. Older evaporation technologies have been used for many years to deposit
these layers. But the thickness precision determines the effectiveness of the
AR. Thickness
variation in conventional evaporation us usually around 10-15% (taking into account both
non-uniformity across substrates and run to run reproducibility). With film thicknesses
of around 100 nm each, that can amount to 15 nm. This greatly reduces
Anti Reflection. In addition,
evaporation is a line of sight technology and substrates have to be placed in a carrousel
high above the evaporative source. In contrast, ALD provides 1% reproducibility and
uniformity across a large batch of stacked substrates enhancing
Anti Reflection and reducing cost.
In addition, both sides of components can be coated at the same time.