ANTIREFLECTION

Anti reflection (AR) coatings are essential in the optical and ophthalmic industries. They usually consist of low-high refractive index multilayers, such as SiO2 -ZrO2 or SiO2-TiO2. Older evaporation technologies have been used for many years to deposit these layers. But the thickness precision determines the effectiveness of the AR. Thickness variation in conventional evaporation us usually around 10-15% (taking into account both non-uniformity across substrates and run to run reproducibility). With film thicknesses of around 100 nm each, that can amount to 15 nm. This greatly reduces Anti Reflection. In addition, evaporation is a line of sight technology and substrates have to be placed in a carrousel high above the evaporative source. In contrast, ALD provides 1% reproducibility and uniformity across a large batch of stacked substrates enhancing Anti Reflection and reducing cost. In addition, both sides of components can be coated at the same time.