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ANTI CORROSION

Although so far little work has been performed to study the anti-corrosion properties of ALD deposited coatings, we expect this to work extremely well. For example a combination of Al2O3 as humidity barrier and passivation layer, and ZrO2 as an inert chemical resistant layer could serve this purpose. With ALD it is uniquely possible to create a combination of amorphous diffusion barrier layers with crystalline chemical resistant layers. Depending on the exposed environment of the substrates, even ultra-thin noble metal layers could be sandwiched in an anti-corrosion nanolaminate. Low stress, good adhesion and the need for only very thin layers due to conformality of coatings inside crevices of rough substrates prevents peeling and cracking. Cambridge NanoTech would be happy to provide test samples on any type of substrate.

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.