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Atomic Layer Deposition

 

Atomic Layer Deposition

ALD offers precise control of depositions down to the atomic scale. ALD is renowned for its film quality. Such control is the result of meticulous design and understanding that can only come from knowledgeable ALD experts.

The principle of ALD is based on sequential pulsing of special precursor vapors, each of which forms about one atomic layer each pulse. Cambridge NanoTech systems, such as the Savannah™, are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities. The ability to deposit such high quality films on substrates with ultra-high aspect ratios is a key feature of Cambridge NanoTech systems.

A wide variety of thin films can be deposited using gas, liquid or solid precursors. Please see a list of materials that are commonly used in our ALD materials section.