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ALD offers precise control of depositions down to the atomic scale. From accelerating the speed of semiconductors to improving the efficiency of solar panels. ALD holds tremendous promise across a wide array of industries, including energy, optical, electronics, nanostructures, biomedical, and more. 

The principle of ALD is based on sequential pulsing of special precursor vapors, each of which forms about one atomic layer each pulse. Cambridge NanoTech systems, such as the Savannah™, are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities. The ability to deposit such high quality films on substrates with ultra-high aspect ratios is a key feature of Cambridge NanoTech systems.

A wide variety of thin films can be deposited using gas, liquid, or solid precursors. Please see a list of materials that are commonly used in our ALD materials section.