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ATOMIC LAYER DEPOSITION ADVANTAGES

1. Digital thickness control to atomic level (no rate monitor needed, just set the number of atomic layers).
2. Perfect 3D conformality, 100% step coverage: uniform coatings on flat, inside porous and around particle samples.
3. Large area thickness uniformity.
4. Easy batch scalability (precursor sources are small and stacking of substrates is possible).
5. Pinhole free films, even over very large areas.
6. Excellent repeatability (wide process windows: ALD is not sensitive to temperature or precursor dose variations).
7. Low defect density.
8. Excellent adhesion due to chemical bonds at the first layer.
9. Digital control of sandwiches, heterostructures, nanolaminates, mixed oxides, graded index layers and doping.
10. Gentle deposition process for sensitive substrates, no plasma.
11. Low temperature deposition possible (RT-400C).
12. Atomically flat and smooth coating, copies shape of substrate perfectly.
13. Low stress because of molecular self assembly.
14. 100% film density guarantees ideal material properties (n, Ebd, k, etc).
15. Insensitive to dust (grows underneath dust!).
16. Oxides, nitrides, metals, semiconductors possible (Cambridge NanoTech provides standard recipes).
17. Amorphous or crystalline depending on substrate and temperature.
18. Coats on everything, even on teflon.
19. High production yields due to all these process benefits.

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.