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Cambridge NanoTech Inc.
Some customer testimonials:
1. From Old Dominion University, Prof. Baumgart:
One of my students " Kanda Tapily " enjoyed numerous helpful contacts with you and appreciates your valued technical advise on whatever issues and questions did arise during his work. The Cambridge Nanotech ALD system works really fine and we are very happy about the tool. This ALD tool can be easily managed by graduate students in a university environment and works like a charm.
2. Professor Goldhaber-Gordon from Stanford University wrote:
The ALD system runs smoothly, producing conformal, high-breakdown aluminum oxide on a variety of substrates (we'll soon try depositing other materials). Cambridge Nanotech support is great -- they always respond to technical questions very fast and give useful suggestions.
3. Email received from Prof. Marek Godlewski PAS:
We are very happy with the new ALD system SAVANNAH 100, which we bought from Cambridge NanoTech Inc. We have grown more than 100 samples within the first 5 months after the purchase of this ALD system and the system worked perfectly. Presently we work on thin films of ZnO and ZnMnO, the first material for new electronics applications, the latter material for spintronics applications. It turned out to be very crucial to grow ZnO and ZnMnO at very low temperatures. In the case of ZnMnO we could avoid so-called spinodal decomposition and also accumulation of foreign Mn oxide phases. The obtained material was very homogeneous showing preferential magnetic properties.
4. Email received from customer Dr. Thomas W. Scharf:
"UNT is using the Cambridge NanoTech ALD system to deposit solid lubricant and nanocrystalline lubricous oxides for moving mechanical assembly (MMA) applications, such as fully assembled, miniature steel rolling element bearings and silicon MEMS. UNT is very happy with the system, technical support, ALD expertise and timeliness in responses from Cambridge NanoTech."
5. From Marcello Zucca, Laboratorio di Chimica per le Tecnologie Università di Brescia, Italy
ALD system of Cambridge Nanotech is a perfect instrument to deposit nanometric films of metal oxides. The instrument is very reliable and thanks to interface it's very easy to use. We are able to deposit without problems titanium and zinc oxide and soon other oxides. We have obtained great results also thanks to the constant support of cambridge Nanotech. The customer assistance has always been helpful, fast and kind.
6. Email received from customer Andrzej Szczerbakow, DSc., Poland:
As a co-author of an international project accepted in difficult competition for financing by the European Union, I took up responsibility for technology of ZnO thin films by ALD in the Institute of Physics of Polish Academy of Sciences in Warsaw. The project page is: http://www.mdm.infm.it/Versatile Next, I was horrified by the local administrative decisions leading to performing the experimental tasks exclusively by a spectroscoper with close to zero experience in materials processing. Fortunately, first experiments on ZnO film growth with your reactor delivereded fine, REPRODUCIBLE results, and systematic variation of the process parameters allowed fulfilling the tasks of optimization in a short time. What a relax! In the reporting session of the project consortium after the first year of the program, I was happy to say in the presence of the project reviewers that Savannah-100 proved to be quite suitable for the goals of the project. I believe that any diligent operator - a spectroscoper, theorist, lawyer or politician - should achieve success in ZnO film growth with your reactor.
7. From a customer who asked their startup company is not mentioned due to the proprietary nature of their work:
"Cambridge NanoTech has been most excellent to provide expertise and starting points for developing processes to push our technology to the next level. Their customer support is excellent. We've been using the Savannah system to grow films from the first day it was installed."
HAPPY LAYERING!
1. From Old Dominion University, Prof. Baumgart:
One of my students " Kanda Tapily " enjoyed numerous helpful contacts with you and appreciates your valued technical advise on whatever issues and questions did arise during his work. The Cambridge Nanotech ALD system works really fine and we are very happy about the tool. This ALD tool can be easily managed by graduate students in a university environment and works like a charm.
2. Professor Goldhaber-Gordon from Stanford University wrote:
The ALD system runs smoothly, producing conformal, high-breakdown aluminum oxide on a variety of substrates (we'll soon try depositing other materials). Cambridge Nanotech support is great -- they always respond to technical questions very fast and give useful suggestions.
3. Email received from Prof. Marek Godlewski PAS:
We are very happy with the new ALD system SAVANNAH 100, which we bought from Cambridge NanoTech Inc. We have grown more than 100 samples within the first 5 months after the purchase of this ALD system and the system worked perfectly. Presently we work on thin films of ZnO and ZnMnO, the first material for new electronics applications, the latter material for spintronics applications. It turned out to be very crucial to grow ZnO and ZnMnO at very low temperatures. In the case of ZnMnO we could avoid so-called spinodal decomposition and also accumulation of foreign Mn oxide phases. The obtained material was very homogeneous showing preferential magnetic properties.
4. Email received from customer Dr. Thomas W. Scharf:
"UNT is using the Cambridge NanoTech ALD system to deposit solid lubricant and nanocrystalline lubricous oxides for moving mechanical assembly (MMA) applications, such as fully assembled, miniature steel rolling element bearings and silicon MEMS. UNT is very happy with the system, technical support, ALD expertise and timeliness in responses from Cambridge NanoTech."
5. From Marcello Zucca, Laboratorio di Chimica per le Tecnologie Università di Brescia, Italy
ALD system of Cambridge Nanotech is a perfect instrument to deposit nanometric films of metal oxides. The instrument is very reliable and thanks to interface it's very easy to use. We are able to deposit without problems titanium and zinc oxide and soon other oxides. We have obtained great results also thanks to the constant support of cambridge Nanotech. The customer assistance has always been helpful, fast and kind.
6. Email received from customer Andrzej Szczerbakow, DSc., Poland:
As a co-author of an international project accepted in difficult competition for financing by the European Union, I took up responsibility for technology of ZnO thin films by ALD in the Institute of Physics of Polish Academy of Sciences in Warsaw. The project page is: http://www.mdm.infm.it/Versatile Next, I was horrified by the local administrative decisions leading to performing the experimental tasks exclusively by a spectroscoper with close to zero experience in materials processing. Fortunately, first experiments on ZnO film growth with your reactor delivereded fine, REPRODUCIBLE results, and systematic variation of the process parameters allowed fulfilling the tasks of optimization in a short time. What a relax! In the reporting session of the project consortium after the first year of the program, I was happy to say in the presence of the project reviewers that Savannah-100 proved to be quite suitable for the goals of the project. I believe that any diligent operator - a spectroscoper, theorist, lawyer or politician - should achieve success in ZnO film growth with your reactor.
7. From a customer who asked their startup company is not mentioned due to the proprietary nature of their work:
"Cambridge NanoTech has been most excellent to provide expertise and starting points for developing processes to push our technology to the next level. Their customer support is excellent. We've been using the Savannah system to grow films from the first day it was installed."
HAPPY LAYERING!