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PLUG and PLAY

Add functionality with the following accessories
that can be added at any time:

¤ Up to 6 heated precursor lines.
¤ Liquid, solid and gas precursors.
¤ Low vapor pressure precursor booster.
¤ Ozone generator
¤ Remote plasma for our Fiji™ model.
¤ Single wafer or 10 wafer batch with dome lid.
¤ Glovebox adapter (OLED and organic TFT apps.).
¤ High temp. substrate heating (up to 650°C).

Nitrogen or argon carrier gas uses separate inputs and does not reduce the number of available precursor lines.

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.