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3D CUSTOM DESIGN

Your substrates are not only round and thin. They are rectangular, oblong or triangular. Your substrates have cavities, pores, trenches, tubes or nanoparticles. No shape too small, large or odd. They can all be coated uniformly. Request documentation today about our custom line ALD models.

¤ High-end load-locked UHV conflat Fiji™ R&D model.
¤ Industrial Phoenix™ flatpanel and wafer batch ALD. ¤ Large coating service industry batch ALD systems.
¤ Atomic layer epitaxy, substrate temp up to 1000C.
¤ Integration with analytical and PVD systems
¤ SolidWorks™ 3D-CAD rapid prototyping.
¤ Sample films and demo runs.

ALD is suitable for many applications in Semiconductors and nanoelectronics including Gate Dielectrics, Gate Electrodes, Diffusion Barriers, and DRAM | Dynamic Random Access Memory. In the optical fields, ALD can be applied to Optical Dielectric Multilayer Structures / Filters, OLED (Organic Light Emitting Diode), Photonic Crystals and static Photonic Band Tuning, Transparent Conductors and Transparent Conducting Electrodes, TFEL or Thin Film Electroluminesence, Solar Cells, OLED Humidity Barrier, Precision Optics Coatings and Photonic Crystal Structures and Lasers. ALD is also applied to MEMS (micro electromechanical systems and Hydrophic & Anti-Stiction Layers in MEMS Devices. There are also applications of ALD in wear resistence, in coatings for blade edges and Nanocomposite Tungsten Disulphide solid lubricants. ALD is also used in nanostructures such as nanotubes & nanowires, and Atomic Force Microscope (AFM) tips. Other common applications of ALD are Catalysis & Catalyst Supports, Solid Oxide Fuel Cell Electrodes, Nano Glue, Biocompatible Coatings for medical instruments Ferromagnetic Transition Metals & Nanotubes and Internal Tube Liners and Inert Inner Linings.